Publication: Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon
dc.affiliation.dpto | UC3M. Departamento de Matemáticas | es |
dc.affiliation.grupoinv | UC3M. Grupo de Investigación: Interdisciplinar de Sistemas Complejos (GISC) | es |
dc.contributor.author | Keller, Adrian | |
dc.contributor.author | Cuerno, Rodolfo | |
dc.contributor.author | Facsko, Stefan | |
dc.contributor.author | Möller, Wolfhard | |
dc.date.accessioned | 2010-02-16T12:08:54Z | |
dc.date.available | 2010-02-16T12:08:54Z | |
dc.date.issued | 2009-03-15 | |
dc.description | 7 pages, 5 figures.-- PACS nrs.: 81.16.Rf, 68.37.Ps, 79.20.Rf, 81.65.Cf. | |
dc.description.abstract | The evolution of Si(100) surfaces has been studied during oblique high-fluence ion sputtering by means of atomic force microscopy. The observed surface morphology is dominated by nanoscale ripples and kinetic roughening at small and large lateral scales, respectively. The large-scale morphology exhibits anisotropic scaling at high fluences with different roughness exponents αn = 0.76 ± 0.04 and αp = 0.41 ± 0.04 in the directions normal and parallel to the incident ion beam, respectively. Comparison to the predictions of single field and two-field (“hydrodynamic”) models of ion erosion suggests the relevance of nonlinearities that are not considered in the simpler anisotropic Kuramoto-Sivashinsky equation. | |
dc.description.sponsorship | This work was partially supported by MEC (Spain) through Grant No. FIS2006-12253-C06-01, by UC3M/CAM (Spain) through Grant No. CCG06-UC3M/ESP-0668, and by CAM (Spain) through Grant No. S-0505/ESP-0158. | |
dc.description.status | Publicado | |
dc.format.mimetype | application/pdf | |
dc.identifier.bibliographicCitation | Physical Review B 79, 115437 (2009) | |
dc.identifier.doi | https://www.doi.org/10.1103/PhysRevB.79.115437 | |
dc.identifier.issn | 1098-0121 (Print) | |
dc.identifier.issn | 1550-235x (Online) | |
dc.identifier.uri | https://hdl.handle.net/10016/6878 | |
dc.language.iso | eng | |
dc.publisher | The American Physical Society | |
dc.relation.publisherversion | http://dx.doi.org/10.1103/PhysRevB.79.115437 | |
dc.rights | © The American Physical Society | |
dc.rights.accessRights | open access | |
dc.subject.eciencia | Matemáticas | |
dc.subject.other | [PACS] Micro- and nanoscale pattern formation | |
dc.subject.other | [PACS] Atomic force microscopy (AFM) | |
dc.subject.other | [PACS] Atomic, molecular, and ion beam impact and interactions with surfaces | |
dc.subject.other | [PACS] Surface cleaning, etching, patterning | |
dc.title | Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon | |
dc.type | research article | * |
dc.type.review | PeerReviewed | |
dspace.entity.type | Publication |
Files
Original bundle
1 - 1 of 1
Loading...
- Name:
- anisotropic_cuerno_prb_2009_ps.pdf
- Size:
- 843.42 KB
- Format:
- Adobe Portable Document Format
- Description:
- postprint version