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Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon

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dc.affiliation.dptoUC3M. Departamento de Matemáticases
dc.affiliation.grupoinvUC3M. Grupo de Investigación: Interdisciplinar de Sistemas Complejos (GISC)es
dc.contributor.authorKeller, Adrian
dc.contributor.authorCuerno, Rodolfo
dc.contributor.authorFacsko, Stefan
dc.contributor.authorMöller, Wolfhard
dc.date.accessioned2010-02-16T12:08:54Z
dc.date.available2010-02-16T12:08:54Z
dc.date.issued2009-03-15
dc.description7 pages, 5 figures.-- PACS nrs.: 81.16.Rf, 68.37.Ps, 79.20.Rf, 81.65.Cf.
dc.description.abstractThe evolution of Si(100) surfaces has been studied during oblique high-fluence ion sputtering by means of atomic force microscopy. The observed surface morphology is dominated by nanoscale ripples and kinetic roughening at small and large lateral scales, respectively. The large-scale morphology exhibits anisotropic scaling at high fluences with different roughness exponents αn = 0.76 ± 0.04 and αp = 0.41 ± 0.04 in the directions normal and parallel to the incident ion beam, respectively. Comparison to the predictions of single field and two-field (“hydrodynamic”) models of ion erosion suggests the relevance of nonlinearities that are not considered in the simpler anisotropic Kuramoto-Sivashinsky equation.
dc.description.sponsorshipThis work was partially supported by MEC (Spain) through Grant No. FIS2006-12253-C06-01, by UC3M/CAM (Spain) through Grant No. CCG06-UC3M/ESP-0668, and by CAM (Spain) through Grant No. S-0505/ESP-0158.
dc.description.statusPublicado
dc.format.mimetypeapplication/pdf
dc.identifier.bibliographicCitationPhysical Review B 79, 115437 (2009)
dc.identifier.doihttps://www.doi.org/10.1103/PhysRevB.79.115437
dc.identifier.issn1098-0121 (Print)
dc.identifier.issn1550-235x (Online)
dc.identifier.urihttps://hdl.handle.net/10016/6878
dc.language.isoeng
dc.publisherThe American Physical Society
dc.relation.publisherversionhttp://dx.doi.org/10.1103/PhysRevB.79.115437
dc.rights© The American Physical Society
dc.rights.accessRightsopen access
dc.subject.ecienciaMatemáticas
dc.subject.other[PACS] Micro- and nanoscale pattern formation
dc.subject.other[PACS] Atomic force microscopy (AFM)
dc.subject.other[PACS] Atomic, molecular, and ion beam impact and interactions with surfaces
dc.subject.other[PACS] Surface cleaning, etching, patterning
dc.titleAnisotropic scaling of ripple morphologies on high-fluence sputtered silicon
dc.typeresearch article*
dc.type.reviewPeerReviewed
dspace.entity.typePublication
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