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Energy dependence of the ripple wavelength for ion-beam sputtering of silicon: experiments and theory

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dc.affiliation.dptoUC3M. Departamento de Matemáticases
dc.affiliation.grupoinvUC3M. Grupo de Investigación: Interdisciplinar de Sistemas Complejos (GISC)es
dc.contributor.authorCañadas Castro, Mario
dc.contributor.authorGago, Raúl
dc.contributor.authorMuñoz-García, Javier
dc.contributor.authorCuerno, Rodolfo
dc.date.accessioned2015-12-22T08:57:11Z
dc.date.available2015-12-22T08:57:11Z
dc.date.issued2012-08-05
dc.descriptionThis proceeding at: 22nd International Conference on the Application of Accelerators in Research and Industry (CAARI), took place 2012-Auguts, 05-10, in Fort Worth (Texas).en
dc.description.abstractIn spite of the efforts devoted for the last 20 years to elucidating ion-beam sputtering (IBS) as an instance of surface self-organization, the classic view on the main mechanism inducing the morphological instability has been recently challenged. We report on the verification of a recent theoretical description of this nanopattern formation process for semiconducting targets, as driven by stress-induced, viscous flow of a thin amorphous layer that develops at the surface [M. Cuerno and R. Cuerno, Appl. Surf. Sci. 258, 4171 (2012)]. Through experiments on silicon as a representative case, we study the dependence of the ripple wavelength with the average ion energy, finding a linear dependence in the 0.3-1 keV range. This is explained within the viscous flow framework, taking into account the energy dependence of the number of displaced atoms generated by collision cascades in the amorphous layer, as predicted by previous models of ion-generated stress. For our analysis, we provide a systematic criterion to guarantee actual linear dynamics behavior, not affected by the onset of nonlinear effects that may influence the value of the ripple wavelength.en
dc.description.sponsorshipPartial support has been provided by the Spanish MICINN Grants, Nos. FIS2009-12964-C05-01, -03, and -04, and MEC Grants, Nos. FIS2012-38866-C05-01 and -05, and FIS2012-32349.en
dc.description.statusPublicado
dc.format.extent6
dc.format.mimetypeapplication/pdf
dc.identifier.bibliographicCitationAIP Conference Proceedings 1525 (2013) 380, pp. 380-385.en
dc.identifier.doihttps://www.doi.org/10.1063/1.4802355
dc.identifier.isbn978-0-7354-1148-7
dc.identifier.issn1551-7616 (online)
dc.identifier.issn0094-243X (print)
dc.identifier.publicationfirstpage380
dc.identifier.publicationissue380
dc.identifier.publicationlastpage385
dc.identifier.publicationtitleApplication of Accelerators in Research and Industry. 22nd International Conference on the Application of Accelerators in Research and Industry (CAARI)en
dc.identifier.publicationvolume1525
dc.identifier.urihttps://hdl.handle.net/10016/22121
dc.identifier.uxxiCC/0000022220
dc.language.isoeng
dc.publisherAmerican Institute of Physicsen
dc.relation.eventdate2012, August 05-10en
dc.relation.eventnumber22
dc.relation.eventnumber
dc.relation.eventplaceFort Worth (Texas). Estados Unidos de Américaen
dc.relation.eventtitleInternational Conference on the Application of Accelerators in Research and Industry (CAARI)en
dc.relation.ispartofseriesAIP Conference Proceedingsen
dc.relation.projectIDGobierno de España. FIS-2012-32349es
dc.relation.projectIDGobierno de España. FIS-2009-12964-C05-01es
dc.relation.projectIDGobierno de España. FIS-2009-12964-C05-03es
dc.relation.projectIDGobierno de España. FIS-2009-12964-C05-04es
dc.relation.publisherversionhttp://dx.doi.org/10.1063/1.4802355
dc.rights© 2013 American Institute of Physicsen
dc.rights.accessRightsopen access
dc.subject.ecienciaMatemáticases
dc.subject.otherNanoscale pattern formationen
dc.subject.otherIon-beam sputteringen
dc.subject.otherRipplesen
dc.subject.otherViscous flowen
dc.subject.otherSurfacesen
dc.subject.otherMorphological instabilitiesen
dc.subject.otherHydrodynamic models.en
dc.titleEnergy dependence of the ripple wavelength for ion-beam sputtering of silicon: experiments and theoryen
dc.typeconference paper*
dc.type.hasVersionVoR*
dspace.entity.typePublication
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