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Self-organized nanopattrening of silicon surfaces by ion beam sputtering

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dc.affiliation.dptoUC3M. Departamento de Matemáticases
dc.affiliation.grupoinvUC3M. Grupo de Investigación: Interdisciplinar de Sistemas Complejos (GISC)es
dc.contributor.authorMuñoz-García, Javier
dc.contributor.authorVázquez Burgos, Luis
dc.contributor.authorCañadas Castro, Mario
dc.contributor.authorGago, Raúl
dc.contributor.authorRedondo-Cubero, Andrés
dc.contributor.authorMoreno-Barrado, Ana
dc.contributor.authorCuerno, Rodolfo
dc.date.accessioned2016-01-07T09:25:56Z
dc.date.available2018-01-01T23:00:06Z
dc.date.issued2014-12
dc.description.abstractIn recent years Ion Beam Sputtering (IBS) has revealed itself as a powerful technique to induce surface nanopatterns with a large number of potential applications. These structures are produced in rather short processing times and over relatively large areas, for a wide range of materials, such as metals, insulators, and semiconductors. In particular, silicon has become a paradigmatic system due to its technological relevance, as well as to its mono-elemental nature, wide availability, and production with extreme flatness. Thus, this review focuses on the IBS nanopatterning of silicon surfaces from the experimental and the theoretical points of view. First, the main experimental results and applications are described under the light of the recently established evidence on the key role played by simultaneous impurity incorporation during irradiation, which has opened a new scenario for an improved understanding of the phenomenon. Second, the progress and state-of-art of the theoretical descriptions of the IBS nanopatterning process for this type of targets are discussed. We summarize the historical approach to IBS through simulation techniques, with an emphasis on recent information from Molecular Dynamics methods, and provide a brief overview of the earlier and most recent continuum models for pure and compound systems.es
dc.description.sponsorshipThis work has been partially supported by the Spanish Ministries of Science and Innovation (grants Nos. FIS2009-12964-C05-01, FIS2009-12964-C05-03, FIS2009-12964-C05-04, and BES-2010-036179) and of Economy and Competitiveness (grants Nos. FIS2012-38866-C05-01 and FIS2012-38866-C05-05, FIS2012-32349 and FIS2013-47949-C2-2). A.R.C. also acknowledges funding from SFRH/BPD/74095/2010 (Portugal) and from Juan de la Cierva program (Spain) under contract No. JCI-2012-14509.es
dc.description.statusPublicado
dc.format.extent44es
dc.format.mimetypeapplication/pdf
dc.identifier.bibliographicCitationMaterials Science and Engineering: R: Reports 86 (2014) December pp.1-44.es
dc.identifier.doihttps://doi.org/10.1016/j.mser.2014.09.001
dc.identifier.issn0927-796X
dc.identifier.publicationfirstpage1es
dc.identifier.publicationissueDecemberes
dc.identifier.publicationlastpage44es
dc.identifier.publicationtitleMaterials Science and Engineering R-Reportses
dc.identifier.publicationvolume86es
dc.identifier.urihttps://hdl.handle.net/10016/22125
dc.identifier.uxxiAR/0000016800
dc.language.isoenges
dc.publisherElsevieres
dc.relation.projectIDGobierno de España. FIS-2012-32349es
dc.relation.projectIDGobierno de España. FIS-2012-38866-C05-01es
dc.relation.projectIDGobierno de España. FIS-2012-38866-C05-05es
dc.relation.projectIDGobierno de España. FIS-2013-47949-C2- 2es
dc.rights© 2014 Elsevieres
dc.rightsAtribución-NoComercial-SinDerivadas 3.0 España*
dc.rights.accessRightsopen accesses
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/*
dc.subject.ecienciaIngeniería Industriales
dc.subject.ecienciaMatemáticases
dc.subject.ecienciaMaterialeses
dc.subject.otherIon beam technologyes
dc.subject.otherNanopatterninges
dc.subject.otherSilicones
dc.subject.otherCo-deposition.es
dc.titleSelf-organized nanopattrening of silicon surfaces by ion beam sputteringes
dc.typeresearch article*
dc.type.hasVersionAM*
dspace.entity.typePublication
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