Muñoz-García, JavierCuerno, RodolfoCastro Ponce, Mario2020-03-272020-03-272018-08-1225th Conference on Applications of Accelerators in Research and Industry (CAARI 2018), Grapevine, Texas, USA, August 12-17, 2018. Pp. 124-125.https://hdl.handle.net/10016/30044[Abstract of]: 25th Conference on Applications of Accelerators in Research and Industry (CAARI 2018), Grapevine, Texas, USA, August 12-17, 2018.Ion beam sputtering (IBS) is a powerful technique employed to induce surface nanopatterns over relatively large areas for a wide range of materials [1]. This approach has many applications in modern technology like magnetic storage, quantum device design or, for example, producing the selective attachment of specific molecules to substrates, with implications in biology and catalysis.2engIon beam sputteringNanoscale pattern formationNanopatterningViscous flowconference proceedingsIngeniería Mecánicaopen access12412525th Conference on Applications of Accelerators in Research and Industry (CAARI 2018), Gaylord Texan Resort in Grapevine, Texas, USA, August 12-17, 2018: book of abstracts.CC/0000028221