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Nanopatterning of silicon surfaces by low-energy ion-beam sputtering: dependence on the angle of ion incidence 1053

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Nanopatterning of silicon surfaces by low-energy ion-beam sputtering: dependence on the angle of ion incidence 6 2 3 1 1 3 0

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nanopatterning_cuerno_nt_2002_ps.pdf 1044

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