Collective evolution of submicron hillocks during the early stages of anisotropic alkaline wet chemical etching of Si(100) surfaces

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dc.contributor.author Sana, P.
dc.contributor.author Vazquez Burgos, Luis
dc.contributor.author Cuerno, Rodolfo
dc.contributor.author Sarkar, Subhendu
dc.date.accessioned 2019-10-15T10:07:11Z
dc.date.available 2019-10-15T10:07:11Z
dc.date.issued 2017-10-10
dc.identifier.bibliographicCitation Sana, P. Vázquez, L., Cuerno, R. y Sarkar, S. (2017). Collective evolution of submicron hillocks during the early stages of anisotropic alkaline wet chemical etching of Si(1 0 0) surfaces. Journal of Physics D: Applied Physics, 50(43).
dc.identifier.issn 0022-3727
dc.identifier.uri http://hdl.handle.net/10016/29027
dc.description.abstract We address experimentally the large-scale dynamics of Si(100) surfaces during the initial stages of anisotropic wet (KOH) chemical etching, which are characterized through atomic force microscopy. These systems are known to lead to the formation of characteristic pyramids, or hillocks, of typical sizes in the nanometric/micrometer scales, thus with the potential for a large number of applications that can benefit from the nanotexturing of Si surfaces. The present pattern formation process is very strongly disordered in space. We assess the space correlations in such a type of rough surface and elucidate the existence of a complex and rich morphological evolution, featuring at least three different regimes in just 10 min of etching. Such a complex time behavior cannot be consistently explained within a single formalism for dynamic scaling. The pyramidal structure reveals itself as the basic morphological motif of the surface throughout the dynamics. A detailed analysis of the surface slope distribution with etching time reveals that the texturing process induced by the KOH etching is rather gradual and progressive, which accounts for the dynamic complexity. The various stages of the morphological evolution can be accurately reproduced by computer-generated surfaces composed by uncorrelated pyramidal structures. To reach such an agreement, the key parameters are the average pyramid size, which increases with etching time, its distribution and the surface coverage by the pyramidal structures.
dc.description.sponsorship We gratefully acknowledge discussions with David Nečas, leader of the Gwyddion project. This work was supported by Council of Scientific and Industrial Research (India) Scheme No. 03(1289)/13/EMR-II, and by MINECO/FEDER (Spain/UE) Grants Nos. FIS2012-38866-C05-01, MAT2014-54231-C4-1-P, BIO2016-79618-R, and FIS2015-66020-C2-1-P, as well as by Comunidad Autónoma de Madrid (Spain) Grant NANOAVANSENS S2013/MIT-3029.
dc.format.extent 15
dc.language.iso eng
dc.publisher IOP Publishing
dc.rights © 2017 IOP Publishing Ltd
dc.subject.other Anisotropic etching
dc.subject.other Si pyramidal structures
dc.subject.other Dynamic scaling theory
dc.subject.other Atomic force microscopy
dc.title Collective evolution of submicron hillocks during the early stages of anisotropic alkaline wet chemical etching of Si(100) surfaces
dc.type article
dc.subject.eciencia Matemáticas
dc.identifier.doi https://doi.org/10.1088/1361-6463/aa87e8
dc.rights.accessRights openAccess
dc.relation.projectID Gobierno de España. FIS2012-38866-C05-01
dc.relation.projectID Gobierno de España. MAT2014-54231-C4-1-P
dc.relation.projectID Gobierno de España. BIO2016-79618-R
dc.relation.projectID Gobierno de España. FIS2015-66020-C2-1-P
dc.type.version acceptedVersion
dc.identifier.publicationissue 43
dc.identifier.publicationtitle Journal of Physics D: Applied Physics
dc.identifier.publicationvolume 50
dc.identifier.uxxi AR/0000020621
dc.contributor.funder Ministerio de Economía y Competitividad (España)
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