Ion-beam nanopatterning of silicon surfaces under codeposition of non-silicide-forming impurities

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dc.contributor.author Moon, B.
dc.contributor.author Yoo, S.
dc.contributor.author Kim, J. S.
dc.contributor.author Kang, S. J.
dc.contributor.author Muñoz-García, Javier
dc.contributor.author Cuerno, Rodolfo
dc.date.accessioned 2019-05-17T07:32:29Z
dc.date.available 2019-05-17T07:32:29Z
dc.date.issued 2016-03-22
dc.identifier.bibliographicCitation Moon, B., Yoo, S., Kim, J.-S., Kang, S.J., Muñoz García, J. y Cuerno, R. (2016). Ion-beam nanopatterning of silicon surfaces under codeposition of non-silicideforming impurities. Physical Review B, 93 (11), 115430
dc.identifier.issn 2469-9950
dc.identifier.uri http://hdl.handle.net/10016/28363
dc.description.abstract We report experiments on surface nanopatterning of Si targets which are irradiated with 2-keV Ar+ ions impinging at near-glancing incidence, under concurrent codeposition of Au impurities simultaneously extracted from a gold target by the same ion beam. Previous recent experiments by a number of groups suggest that silicide formation is a prerequisite for pattern formation in the presence of metallic impurities. In spite of the fact that Au is known not to form stable compounds with the Si atoms, ripples nonetheless emerge in our experiments with nanometric wavelengths and small amplitudes, and with an orientation that changes with distance to the Au source. We provide results of sample analysis through Auger electron and energy-dispersive x-ray spectroscopies for their space-resolved chemical composition, and through atomic force, scanning transmission electron, and high-resolution transmission microscopies for their morphological properties. We discuss these findings in the light of current continuum models for this class of systems. The composition of and the dynamics within the near-surface amorphized layer that ensues is expected to play a relevant role to account for the unexpected formation of these surface structures.
dc.description.sponsorship This work was supported by NRF (Korea) Grants No. 2014K2A1A2048433 and No. 2013R1A2000245 and by MINECO (Spain) Grants No. FIS2012-32349, No. FIS2012-38866-C05-01, and No. FIS2015-66020-C2-1-P
dc.format.extent 11
dc.language.iso eng
dc.publisher American Physical Society
dc.rights © 2016 American Physical Society
dc.subject.other Pattern-Formation
dc.subject.other Bombardment
dc.subject.other Si
dc.title Ion-beam nanopatterning of silicon surfaces under codeposition of non-silicide-forming impurities
dc.type article
dc.subject.eciencia Matemáticas
dc.identifier.doi https://doi.org/10.1103/PhysRevB.93.115430
dc.rights.accessRights openAccess
dc.relation.projectID Gobierno de España. FIS2012-32349
dc.relation.projectID Gobierno de España. FIS2015-66020-C2-1-P
dc.relation.projectID Gobierno de España. FIS2012-38866-C05-01
dc.type.version publishedVersion
dc.identifier.publicationissue 11
dc.identifier.publicationtitle Physical Review B
dc.identifier.publicationvolume 93
dc.identifier.uxxi AR/0000017931
dc.contributor.funder Ministerio de Economía y Competitividad (España)
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