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http://hdl.handle.net/10016/6947
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| Title: | Dynamics of rough interfaces in Chemical Vapor Deposition: experiments and model for silica films |
| Author(s): | Ojeda, Fernando
Cuerno, Rodolfo
Salvarezza, Roberto
Vázquez, Luis |
| Publisher: | The American Physical Society |
| Issued date: | 3-Apr-2000 |
| Citation: | Physical Review Letters, 2000, vol. 84, n. 14, p. 3125-3128 |
| URI: | http://hdl.handle.net/10016/6947 |
| ISSN: | 0031-9007 (Print)
1079-7114 (Online) |
| DOI: | 10.1103/PhysRevLett.84.3125 |
| Description: | 4 pages, 5 figures.-- PACS nrs.: 68.55.Jk, 05.10.Gg, 64.60.Ht, 81.15.Gh.-- ArXiv pre-print available at: http://arxiv.org/abs/cond-mat/0003155
Final publisher version available Open Access at: http://gisc.uc3m.es/~cuerno/publ_list.html |
| Abstract: | We study the surface dynamics of silica films grown by low pressure chemical vapor deposition. Atomic force microscopy measurements show that the surface reaches a scale invariant stationary state compatible with the Kardar-Parisi-Zhang (KPZ) equation in three dimensions. At intermediate times the surface undergoes an unstable transient due to shadowing effects. By varying growth conditions and using spectroscopic techniques, we determine the physical origin of KPZ scaling to be a low value of the surface sticking probability, related to the surface concentration of reactive groups. We propose a stochastic equation that describes the qualitative behavior of our experimental system. |
| Sponsor: | This work has been performed within the CONICET-CSIC and Programa de Cooperación con Iberoamérica (MEC) research programs, and has been partially supported by CAM Grants No. 7220-ED/082, No. 07N-0028, and DGES Grants No. MAT97-0698-C04 and No. PB96-0119. F. O. acknowledges support by CAM. |
| Review: | PeerReviewed |
| Publisher version: | http://dx.doi.org/10.1103/PhysRevLett.84.3125 |
| Keywords: | [PACS] Structure and morphology; thickness; crystalline orientation and texture
[PACS] Stochastic analysis methods (Fokker-Planck, Langevin, etc.)
[PACS] Dynamic critical phenomena
[PACS] Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.) |
| Rights: | © The American Physical Society |
| Appears in Collections: | DM - GISC - Artículos de Revistas
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