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Please use this identifier to cite or link to this item: http://hdl.handle.net/10016/6932

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Title: Production of ordered silicon nanocrystals by low-energy ion sputtering
Author(s): Gago, Raúl
Vázquez, Luis
Cuerno, Rodolfo
Varela, María
Ballesteros, Carmen
Albella, José María
Publisher: American Institute of Physics
Issued date: 21-May-2001
Citation: Applied Physics Letters 78, 3316 (2001)
URI: http://hdl.handle.net/10016/6932
ISSN: 0003-6951 (Print)
1077-3118 (Online)
DOI: 10.1063/1.1372358
Description: 3 pages, 3 figures.-- PACS nrs.: 81.16.Rf, 79.20.Rf, 68.66.Hb, 68.35.Ct.
ArXiv pre-print available at: http://arxiv.org/abs/cond-mat/0106542
Final publisher version available Open Access at: http://gisc.uc3m.es/~cuerno/publ_list.html
Abstract: We report on the production of ordered assemblies of silicon nanostructures by means of irradiation of a Si (100) substrate with 1.2 keV Ar+ ions at normal incidence. Atomic force and high-resolution transmission electron microscopies show that the silicon structures are crystalline, display homogeneous height, and spontaneously arrange into short-range hexagonal ordering. Under prolonged irradiation (up to 16 h) all dot characteristics remain largely unchanged and a small corrugation develops at long wavelengths. We interpret the formation of the dots as a result of an instability due to the sputtering yield dependence on the local surface curvature.
Sponsor: This work has been partially supported by DGES (Spain) Grant Nos. MAT1999-0830-C03-01, MAT2000-0375-C02-02, and BFM2000-0006.
Review: PeerReviewed
Publisher version: http://dx.doi.org/10.1063/1.1372358
Keywords: Silicon
Semiconductor quantum dots
Nanostructured materials
Nanotechnology
Sputtering
Transmission electron microscopy
Atomic force microscopy
Surface structure
Elemental semiconductors
Short-range order
Rights: © American Institute of Physics
Appears in Collections:DM - GISC - Artículos de Revistas

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